... 1999, Vol 32, Iss 19, ШИФР ХРАНЕНИЯ БЕН РАН: U53050 Автор(ы): JY Zhang, IW Boyd, V Dusastre, DE Williams Название: Ultraviolet annealing of tantalum oxide films grown by photo-induced chemical vapour deposition Страницы: L91-L95 Заказ : Автор(ы): JBA Card ...
... When D 2 the integral is dominated by the ultraviolet for slow quenches, which needs to be cut off at distance scale 0 . ... Provided quenches are fast enough that we can ignore the ultraviolet effects, it follows from equation (15) that f takes the ...
... The deposited films were patterned by deep ultraviolet (UV) lithography and ion beam etching in an Ar plasma to form Josephson junctions, planar antennas and contact pads. ...