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14.09.2009
(, , - ): . . . In situ . - , , .


( ) ? 1. (« ») tm ­ melting temperature tb ­ boiling ( vaporization) temperature

,

2009: 90th Edition, 2804 p


( )

: - -

tb 4409 C tb 3287 C

m.p. ­ melting point


? 2. : , , , .....



( SiO2)


... ( - )






«» , in situ , , , .....




: NT (carbon nanotubes)

Single wall (SWNT); STM-

0.34 Multi wall (MWNT); TEM- Chem.Rev. 99(1999) 1787-99 Needle-like (NLT)

Carbon 47 (2009) 3099-3105




: TEM-

Nano Letters 9 (2009) 30

Phys. Rev. Lett. 97 (2006) 187401 (arc) ­ CVD. .


() () ­ , (: ) 3 SiH4 + 4 NH3 Si3N4 + 12 H
2

() ­ , ( - ) ( : ) SiCl2H2 + 2 N2O SiO2 + 2 N2 + 2 HCl ­ , , (: ) H4 C + H2 ­ , ,

O C + CO2
­ ; ( ) -


(): () (Aerosol Assisted, AACVD) -«»

-«» (wafer, support, substrate, mount, frame)

(Direct Liquid Injection, DLICVD) p = «» (precursors) (by-products)

(volatile)

­ () ­ F, Cl, Br, I ( ) - (M[OR]n, R ­ « ») ­ - Metalorganic Chemical Vapor Deposition (MOCVD)


­

1

- - ( ) - - -

-diketonates (-)




-

( ­ M) ­ - -, hfac)

2

-: - -

Y(hfac)

3

- 6

3




CVD

<< 1

CVD- «» (1 ­ 400 ) Chem. Rev. 102 (2002) 1525-49


(-)



CdS

J. Electrochem. Soc. 151 (2004) G428-35

-


CVD ­

IUPAC Nomenclature of Organic Chemistry
, : 2 3 1 1,2- = = o- (-) 1 (xelene) = 4 1

1,3- = 1,4- = = m- (-) = p- (-)

http://www.acdlabs.com/iupac/nomenclature/ http://www.alhimik.ru/sprav/name02.html


( , - )

- « »

...

( , ­ ) , ( )








(+MD)

- : k~ : k ( + )


HVCVD (`High Vacuum') 10
-9

LPCVD (Low Pressure)
-6

APCVD (Atmospheric Pressure) 10
3

10

10

-3

10

0

log(p, Pa)

( ) - (0.15В0.30)·tm (at-CVD) Rapid Thermal (RTCVD) Hot Wire (HWCVD) = = Hot Filament (HFCVD)

( ) + : Plasma Enchanced (PECVD) Plasma Assisted (PACVD); Microwave Plasma-Assisted (MAPCVD) Laser Assisted CVD


p, T, ....

()

( , QCM)

... -


Microhotplate array CVD TiO2 Ti(NO3) Chem. Mater. 14 (2002) 1071
4

120 C

210 C

296 C

392 C Chem. Rev. 108 (2008) 770-813


: two-step CVD continuous-feed CVD

(PECVD ) -

-

(Fe) + Fe J. Electrochem. Soc. 137 (1990) 2209-15

Carbon 47 (2009) 384-395


Ultraviolet-assisted injection liquid source CVD (UVILS-CVD)

Zr[OC(CH3)3]4 +N2O ZrO2 + N


2

1.

..... ...... 4. Appl. Surface Sci. 253 (2007) 7942-46


. (XPS = ) () - (UPS = )

200 C ­ Zr 400 C ­ Zr

XPS: ZrO2 Si(100)

: (, ) Appl. Surface Sci. 253 92007) 7942-46


, . - (Auger) .

LPCVD, SiH4 + GeH

4

J. Electrochem. Soc. 151 (2004) G13-17


. . , 930 -1

J. Electrochem. Soc. 137 (1990) 2209-15




.., , M., , 2000, 286. 2006: http://www.chemphys.edu.ru/media/files/HAPT_01......_10