ÈÑÒÈÍÀ

Bijkerk F.

Ñîàâòîðû: Ëîïàåâ Ä.Â., Lee C.J., Krivtsun V.M., Ãðûçëîâà Å.Â., Ãðóì-Ãðæèìàéëî À.Í., Siu W., Yakushev O.F., Rouzee A., Âàñèëüåâà À.Í., Louis E., Êàáà÷íèê Í.Ì., Ðàõèìîâà Ò.Â., Çîòîâè÷ À.È. ïîêàçàòü ïîëíîñòüþ..., Vrakking M.J., Êîâàëåâ À.Ñ., Ueda K., Yamada A., Çûðÿíîâ Ñ.Ì., Astakhov D.I., Dolgov A., Fukuzawa H., Huismans Y., IVANOV V.V., Johnsson P., Goedheer W.J., Holland D.M.

3 ñòàòüè

Êîëè÷åñòâî öèòèðîâàíèé ñòàòåé â æóðíàëàõ ïî äàííûì Web of Science: 22, Scopus: 19

IstinaResearcherID (IRID): 837299

Äåÿòåëüíîñòü ñòèëü:  îáû÷íûé | ÃÎÑÒ | plain | abbrv | acm | alpha | amsalpha | amsplain | apalike | ieeetr | siam

• Ñòàòüè â æóðíàëàõ

  • 
    • 2015 Plasma probe characteristics in low density hydrogen pulsed plasmas
    • Astakhov D.I., Goedheer W.J., Lee C.J., Ivanov V.V., Krivtsun V.M., Zotovich A.I., Zyryanov S.M., Lopaev D.V., Bijkerk F.
    • â æóðíàëå Plasma Sources Science and Technology, èçäàòåëüñòâî Institute of Physics Publishing (United Kingdom), òîì 24, ? 5, ñ. 055018 DOI
  • 
    • 2014 Comparison of H 2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas
    • Dolgov A., Lopaev D., Rachimova T., Kovalev A., Vasil?eva A., Lee C.J., Krivtsun V.M., Yakushev O., Bijkerk F.
    • â æóðíàëå Journal of Physics D - Applied Physics, èçäàòåëüñòâî Institute of Physics Publishing (United Kingdom), òîì 47, ? 6, ñ. 065205 DOI
  • 
    • 2011 Angle-resolved photoelectron spectroscopy of sequential three-photon triple ionization of neon at 90.5 eV photon energy
    • Rouzee A., Johnsson P., Gryzlova E.V., Fukuzawa H., Yamada A., Siu W., Huismans Y., Louis E., Bijkerk F., Holland D.M.P, Grum-Grzhimailo A.N., Kabachnik N.M., Vrakking M.J.J, Ueda K.
    • â æóðíàëå Physical Review A - Atomic, Molecular, and Optical Physics, èçäàòåëüñòâî American Physical Society (United States), òîì 83, ? 3, ñ. 031401(R1)-031401(R4) DOI